GITNUXSOFTWARE ADVICE
Art DesignTop 9 Best Pattern Maker Software of 2026
Ranked list of the top 10 Pattern Maker Software tools with technical criteria, tool comparisons, and notes for apparel and CAD users.
How we ranked these tools
Core product claims cross-referenced against official documentation, changelogs, and independent technical reviews.
Analyzed video reviews and hundreds of written evaluations to capture real-world user experiences with each tool.
AI persona simulations modeled how different user types would experience each tool across common use cases and workflows.
Final rankings reviewed and approved by our editorial team with authority to override AI-generated scores based on domain expertise.
Score: Features 40% · Ease 30% · Value 30%
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Editor’s top 3 picks
Three quick recommendations before you dive into the full comparison below — each one leads on a different dimension.
Antenna Design Studio
Revisioned, parameterized pattern data model that supports controlled provisioning and synchronization.
Built for fits when mid-size teams need controlled, API-driven pattern generation..
Gerber AccuMark
Editor pickAccuMark pattern data model that ties grading and measurement logic to CAD-ready pattern assets.
Built for fits when teams need governed pattern data integration with repeatable automation..
Optitex
Editor pickRule-based grading tied to measurement updates that recalculates size runs automatically.
Built for fits when mid-size design teams need integration and controlled pattern automation..
Related reading
Comparison Table
The comparison table evaluates pattern maker software by integration depth, including the data model used for patterns, grading rules, and measurement units across toolchains. It also compares automation and API surface for tasks like provisioning, configuration, and extensibility, plus admin and governance controls such as RBAC and audit log coverage. The goal is to map tradeoffs that affect workflow throughput and cross-system consistency rather than list feature sets.
Antenna Design Studio
pattern drafting SaaSWeb-based pattern creation tool that supports garment pattern drafting workflows and export-ready pattern outputs for production use.
Revisioned, parameterized pattern data model that supports controlled provisioning and synchronization.
Antenna Design Studio functions as a pattern design workspace that records geometry inputs, constraints, and generated pattern outputs in a coherent data model. The integration depth centers on how pattern parameters and revision metadata are represented so external systems can provision, validate, and synchronize design sets. Automation is most effective when changes are driven by structured inputs rather than manual edits. The admin layer supports governance through RBAC and auditability for revision activity.
A common tradeoff is that deeper custom automation requires alignment to the product's schema for pattern parameters and revision history. It fits teams that need repeatable pattern generation with controlled change flow, such as engineering groups issuing pattern packages to downstream manufacturing. It is also a strong fit when an API-driven workflow must enforce configuration consistency across multiple design variants. For exploratory geometry iteration, teams may spend more time mapping inputs to the expected configuration structure.
- +Parameterized pattern generation keeps geometry consistent across revisions
- +Schema-oriented design data improves integration mapping for provisioning
- +RBAC and audit log support controlled change tracking
- +Automation surface supports configuration-driven updates
- –Custom automation depends on the established pattern parameter schema
- –Exploratory edits can require more input mapping than freeform tools
- –Integration requires careful alignment to revision metadata structures
Antenna engineering teams
Generate repeatable pattern variants
Lower rework across revisions
Manufacturing integration teams
Provision pattern packages to shop floor
Fewer mismatched production runs
Show 2 more scenarios
Operations governance teams
Track approvals and access by role
Clear accountability for changes
RBAC and audit log capture who changed what and when across pattern revisions.
System integrators
Automate configuration changes via API
Higher throughput for variants
API-driven automation updates structured pattern inputs without manual geometry edits.
Best for: Fits when mid-size teams need controlled, API-driven pattern generation.
More related reading
Gerber AccuMark
CAD-to-manufactureDigital pattern design and marker optimization suite that converts garment patterns into manufacturing-ready marker layouts and reports.
AccuMark pattern data model that ties grading and measurement logic to CAD-ready pattern assets.
Gerber AccuMark is a pattern maker solution used when pattern assets must remain consistent from concept to production, including grading, marker prep inputs, and specification management. Integration depth matters because pattern changes must propagate into downstream processes without manual rework. The data model supports structured pattern, size, and measurement definitions that reduce ambiguity when multiple teams touch the same styles.
A key tradeoff is that high-throughput automation depends on integration setup discipline rather than ad hoc scripting, since pattern data changes must follow the tool’s schema and rules. AccuMark fits best when a team needs controlled batch updates for style libraries or centralized governance for pattern variations across product lines.
- +Pattern-centric data model supports grade and measurement consistency
- +Ecosystem integration reduces manual translation between pattern and production steps
- +Config-driven workflow supports repeatable outputs across style libraries
- +Automation surface supports governed updates for CAD pattern changes
- –API and automation coverage is strongest within Gerber ecosystem workflows
- –Schema-aligned change workflows add overhead for small one-off pattern edits
- –Integration setup requires planning for pattern data ownership and mappings
Apparel product engineering
Standardize graded patterns across size runs
Fewer mismatched size outputs
Operations and merchandising
Control pattern revisions for style libraries
Reduced rework from drift
Show 2 more scenarios
Manufacturing systems teams
Integrate pattern outputs into planning
Faster time from pattern to marker
Connects CAD pattern assets into downstream workflows with stable mappings.
Design automation teams
Batch update patterns using automation
Higher throughput with governance
Runs repeatable updates that respect the pattern schema and rules.
Best for: Fits when teams need governed pattern data integration with repeatable automation.
Optitex
marker automationClothing design and pattern cutting environment that models garment patterns and generates automated markers for cutting rooms.
Rule-based grading tied to measurement updates that recalculates size runs automatically.
Optitex is built around pattern and grading constructs that map to repeatable operations across style variants. The data model keeps relationships between pattern geometry, measurements, and grading rules so changes propagate through the design logic instead of requiring manual redraws. Automation comes from scripted and parameter-driven edits that keep throughput high during frequent collection updates. Integration depth is most relevant when pattern changes must sync with downstream PLM or production databases via API and import export schemas.
A key tradeoff is that governance and RBAC-like controls depend on how the broader environment deploys Optitex artifacts, because pattern files and derived outputs often need careful permission boundaries. Teams usually get the best usage when a single pattern source of truth must drive mass customization or rapid size-run updates. When approvals and auditability are required, configuration must be paired with traceable change records in the system that owns the review workflow.
- +Pattern and grading rules propagate edits across size variants
- +Parameter-driven automation reduces redraw loops during style iterations
- +Extensibility supports integration with production and lifecycle systems
- –Governance depends on the surrounding environment’s deployment controls
- –Schema mapping can be work-intensive for nonconforming downstream data
- –High automation usage requires consistent measurement and variant conventions
Pattern engineering teams
Maintain size runs across weekly collections
Fewer pattern rework cycles
Operations systems teams
Sync pattern outputs with PLM
Reduced downstream mismatches
Show 2 more scenarios
Enterprise apparel design groups
Control approvals for pattern variants
Clear change provenance
Apply configuration discipline and external audit logs to manage review history and access boundaries.
Manufacturing setup teams
Prepare production-ready pattern data
Shorter setup turnaround
Generate technical outputs from the same pattern data model used for grading operations.
Best for: Fits when mid-size design teams need integration and controlled pattern automation.
Browzwear
3D apparel design3D apparel and pattern design workflow tool that supports pattern creation inputs and iterative sizing for sampling.
Garment data model propagates pattern, grading, and marker edits through configured fit workflows.
Browzwear focuses on pattern making and fit workflows tied to digital garment data, including grading and marker workflows. The data model centers on garment construction inputs that propagate through fit, size, and production views.
Integration depth is strongest around digital apparel pipelines, where configuration drives repeatable pattern transformations. Automation and extensibility are handled through documented APIs and integration hooks that support schema-aligned provisioning and controlled throughput for recurring work.
- +Pattern, grading, and marker workflows share a single garment data model
- +Extensibility supports automation via API and integration hooks
- +Configuration-driven runs help reproduce pattern outputs across teams
- +Built for apparel-specific schema and construction constraints
- +Integration focus aligns with downstream fit and production pipeline
- –Automation surface depends on integration design choices by the implementing team
- –Governance controls like RBAC and audit log depth may require separate setup
- –Complex construction variants can increase maintenance of integration mappings
- –Throughput under batch workloads depends on render and solver workloads
- –API-driven workflows require schema discipline across systems
Best for: Fits when apparel teams need automated pattern transformations with governed integrations and controlled throughput.
CLO Virtual Fashion
virtual prototypingVirtual fashion software that connects garment patterns to 3D visualization so pattern edits can be tested across sizes.
Size table grading with measurement-driven pattern generation and 2D to 3D garment synchronization.
CLO Virtual Fashion generates pattern-making workflows inside a garment-focused 2D and 3D design environment. It supports model-to-pattern iteration using size tables and grading settings, then feeds those changes into simulation-ready 3D assemblies.
Integration depth depends on how CLO Virtual Fashion is wired into PLM and production systems through file exchange and any available API or automation hooks. Automation surface is largely driven by configurable workflows and repeatable measurement and grading logic rather than event-driven data pipelines.
- +Pattern drafting and grading logic stays consistent across size tables
- +2D-to-3D updates reduce rework between pattern edits and garment review
- +Configurable measurement workflows support repeatable production standards
- +Extensibility through exports enables downstream CAD, PLM, and production steps
- –API automation surface is limited for direct, schema-based provisioning
- –Governance controls like RBAC scope and audit trails are hard to verify
- –Integration often relies on file exchange rather than data synchronization
- –Automation for high-throughput pattern updates can require manual orchestration
Best for: Fits when garment teams need grading-accurate pattern workflows plus periodic export into other systems.
Marvelous Designer
pattern-to-simulationCloth simulation and pattern drafting application that maps 2D pattern pieces into simulated garment behavior for iteration.
Sewing workflow links pattern pieces to garment assembly for consistent 2D to 3D behavior.
Marvelous Designer fits pattern making workflows that need high-fidelity garment simulation and tight iteration loops for physical-looking results. It supports a garment-specific data model built around 2D pattern pieces, 3D draping, and sewing operations with measurable garment properties and constraints.
Integration depth is centered on DCC handoff and pipeline exports, since automation and schema-level extension are more limited than admin-first PLM workflows. Extensibility and governance depend on external pipeline tooling, because native API surface and RBAC controls are not positioned as core administration primitives.
- +2D pattern to 3D drape keeps pattern edits visually testable
- +Sewing and garment constraints define relationships inside the design data model
- +Production-ready exports support downstream DCC and visualization pipelines
- +Simulation iteration reduces manual rework during fitting sessions
- –Automation surface is limited compared with API-first pattern data platforms
- –Schema governance for patterns and assets is not oriented around RBAC and audit log
- –Dataset-level provisioning across teams relies on external pipeline processes
- –High-fidelity simulation can reduce throughput for large batch pattern sets
Best for: Fits when garment teams need simulation-driven pattern iteration with controlled export handoff.
Tailornova
browser pattern designBrowser-based custom garment design and pattern workflow tool that generates garment patterns for made-to-measure outputs.
Schema-driven pattern versioning with rules-based provisioning across sizes and construction steps.
Tailornova focuses on pattern making with a structured production workflow rather than style browsing. Pattern outputs connect to sizing and garment construction steps through a defined data model and repeatable configuration.
Automation is built around provisioning patterns, managing versioned schemas, and applying rules across collections. Extensibility depends on the available API surface for schema, automation triggers, and integration with external systems.
- +Structured data model for patterns and garment construction steps
- +Versioned pattern schemas support controlled iteration and rollback
- +Rules-based provisioning reduces manual rework across similar designs
- +API and configuration enable integration with PLM and internal tooling
- +Automation surface supports repeatable throughput across collections
- –Governance controls like RBAC granularity may lag other enterprise tools
- –Audit log coverage for all changes is unclear for deep compliance needs
- –API surface may require custom mapping for existing pattern formats
- –Automation triggers can be limited for complex cross-item dependencies
Best for: Fits when teams need governed pattern workflows with API-driven integration and repeatable automation.
Tukatech
enterprise apparel CADApparel CAD and pattern design suite that supports pattern development, grading, and production workflows through integrated tooling.
Configurable sizing and grading logic tied to reusable pattern templates and parameters.
Pattern making in Tukatech centers on CAD-driven pattern workflows with configurator-based sizing and grading controls for apparel production. The product focuses on repeatable schema-managed templates, so pattern logic stays consistent across factories and product lines.
Tukatech supports data integration around generated pattern assets and parameters rather than only exporting finished files. Automation and governance depend on how teams structure template provisioning, access rules, and change history across the pattern data model.
- +Template and pattern data model supports consistent sizing and grading outputs
- +Schema-managed pattern definitions reduce drift across product lines
- +Integration centers on pattern parameters and generated asset handoffs
- +Configurator controls support repeatable workflow configuration
- +Extensibility via integration and automation hooks for pipeline throughput
- –Automation and API surface can require internal development to scale governance
- –Cross-team governance depends heavily on disciplined template provisioning
- –Complex workflows may increase configuration overhead for admins
- –Integration depth varies by how pattern assets map to downstream schemas
Best for: Fits when apparel teams need governed pattern schemas and automation-friendly asset handoffs.
Zund GSS
production workflowProduction cutting software ecosystem that pairs pattern layouts with nesting and shop-floor workflow controls for fabrication.
Pattern job integration that maps defined parameters from inputs to executable Zund production runs.
Zund GSS generates and manages production patterns through an integration-first workflow tied to Zund cutting systems. It supports pattern data definitions, versioned configurations, and handoff between design inputs and shopfloor execution.
Its automation surface centers on API and system integrations for provisioning pattern jobs, mapping parameters, and coordinating downstream processing. Governance depends on admin configuration controls that shape who can create, publish, and run pattern-related jobs across connected assets.
- +Tight integration path with Zund cutting systems and production workflows
- +API and automation support for job provisioning and parameter mapping
- +Versioned pattern data handling supports controlled changes over time
- +Configurable schema for pattern inputs and downstream execution mapping
- –Automation relies on integration design and parameter model discipline
- –Pattern data modeling can become complex for highly custom geometries
- –Governance controls depend heavily on how assets and roles are configured
- –Throughput tuning may require careful workflow and integration orchestration
Best for: Fits when teams need Zund pattern job automation with controlled configuration and integration depth.
How to Choose the Right Pattern Maker Software
This buyer's guide covers Antenna Design Studio, Gerber AccuMark, Optitex, Browzwear, CLO Virtual Fashion, Marvelous Designer, Tailornova, Tukatech, and Zund GSS for pattern creation, grading, and production handoff workflows.
It focuses on integration depth, data model design, automation and API surface, and admin and governance controls so pattern changes can be synchronized with controlled throughput across design, simulation, and shop-floor steps.
Pattern maker software that turns design intent into governed pattern assets and downstream-ready layouts
Pattern maker software generates pattern pieces, grading logic, and marker or production outputs from a structured pattern data model that can be reused across size runs and variants. Tools like Antenna Design Studio and Gerber AccuMark tie pattern operations to revisioned or measurement-linked data so grading and pattern edits propagate consistently into manufacturing steps.
This software solves problems in controlled pattern provisioning, repeatable size runs, and minimizing translation drift between pattern editing and downstream operations like markers, cutting, or digital fit. It is typically used by apparel CAD teams, product development groups, and production operations that need repeatable workflows across styles and collections.
Integration, schema, automation, and governance criteria for pattern maker selection
Pattern maker selection succeeds when the pattern data model can map cleanly into provisioning workflows, and automation can run against a documented structure rather than manual exports. Antenna Design Studio and Gerber AccuMark stand out because their pattern data models support controlled synchronization and repeatable governed updates.
Governance matters because pattern changes often touch multiple downstream views, including grading and marker or cutting jobs. Browzwear and Tailornova address governance through configurable runs and rules-based provisioning, while Zund GSS emphasizes admin controls tied to who can publish and run pattern jobs against Zund cutting systems.
Revisioned, parameterized pattern data models for controlled propagation
A revisioned and parameterized model prevents geometry drift across edits and variants, and it supports controlled provisioning and synchronization. Antenna Design Studio uses a revisioned, parameterized pattern data model that keeps pattern changes consistent across variants and production stages, while Optitex propagates rule-based grading changes across size runs from measurement updates.
CAD-grade measurement and grading logic tied to reusable pattern assets
A pattern data model that ties grading and measurement logic to reusable assets reduces rework across size runs and style libraries. Gerber AccuMark connects AccuMark pattern data to CAD-ready pattern assets and measurement logic, while CLO Virtual Fashion maintains size table grading with measurement-driven pattern generation and consistent grading logic across sizes.
Integration depth aligned to downstream workflow artifacts, not only file exports
Integration depth should map pattern parameters and assets into downstream steps with consistent identifiers and metadata. Gerber AccuMark leverages ecosystem connections for downstream manufacturing steps, while Zund GSS maps defined parameters into executable Zund production runs for job provisioning and shop-floor execution.
Documented automation surface and API-friendly configuration points
Automation needs a surface that can be invoked by configuration or API workflows so recurring pattern updates do not require manual orchestration. Antenna Design Studio emphasizes an automation surface driven by configuration with a defined schema, while Browzwear and Tailornova provide API and integration hooks that support controlled throughput for recurring work.
Admin and governance controls with RBAC and traceability of design revisions
Governance must control who can create, update, and publish pattern revisions, and it must provide auditability across those changes. Antenna Design Studio includes RBAC and audit log support for controlled change tracking, while Zund GSS ties governance to admin configuration controls that shape permissions for creating, publishing, and running pattern-related jobs.
Rules-based grading and configured workflow runs for reproducible size transformations
Rules-based operations reduce redraw loops by recalculating size runs from measurement and variant conventions. Optitex recalculates size runs when grading rules tied to measurement updates change, while Tailornova applies rules-based provisioning across sizes and construction steps using versioned pattern schemas.
Decision framework for selecting a pattern maker with the right integration and governance depth
Selection starts by mapping the downstream pipeline steps that must be synchronized with pattern edits, because integration depth varies from data synchronization to file exchange. Zund GSS is built around Zund cutting system execution and parameter mapping for pattern job provisioning, while CLO Virtual Fashion often relies on export-driven handoff into other systems.
Then the evaluation should confirm that automation can run against the pattern data model with predictable schema discipline. Antenna Design Studio and Gerber AccuMark are strong matches when configuration-driven updates and governed model updates must remain consistent across revision metadata and measurement logic.
Identify the primary downstream consumer of pattern data
If Zund cutting systems are the execution destination, Zund GSS provides an integration-first workflow that provisions pattern jobs and maps parameters into executable runs. If downstream manufacturing steps revolve around CAD-ready pattern operations and measurement reuse, Gerber AccuMark ties grading and measurement logic to CAD-ready pattern assets.
Verify the pattern data model supports revision and parameter consistency
For teams that need controlled propagation of geometry across variants, Antenna Design Studio provides a revisioned, parameterized pattern data model for synchronization. For teams that need sizing to recalculate from measurement-driven rules, Optitex supports rule-based grading tied to measurement updates that recalculates size runs automatically.
Stress-test schema mapping and metadata discipline for automation
Automation that depends on custom mapping can slow integration setup, so the workflow should be planned around the established pattern parameter schema in Antenna Design Studio. For teams with repeatable construction and apparel-specific conventions, Browzwear and Optitex reduce redraw loops by propagating edits through configured fit or grading rules across size variants.
Confirm the automation and API surface matches throughput goals
If recurring updates must be handled through automation, Browzwear provides documented APIs and integration hooks with throughput controlled by configured runs. If production pattern job provisioning must be coordinated with connected systems, Zund GSS emphasizes API and system integrations for provisioning and parameter mapping.
Validate governance depth for multi-user revision control
For compliance-oriented teams, Antenna Design Studio supports RBAC and audit log support for controlled change tracking. For environments where governance is administered through connected shop-floor execution, Zund GSS relies on admin configuration controls that determine who can create, publish, and run pattern-related jobs.
Teams that benefit from governed pattern automation and integration-first pattern data models
Pattern maker software selection depends on whether pattern assets must be synchronized across design, simulation, grading, and shop-floor steps with controlled permissions. The best-fit tools in this guide differ by how strongly they anchor automation and governance in the pattern data model.
The sections below map typical workflows to tools that match those requirements through revisioned parameters, measurement-tied grading, API-driven automation, or job provisioning integration.
Mid-size apparel teams needing API-driven, controlled pattern generation
Antenna Design Studio targets controlled provisioning and synchronization with a revisioned, parameterized pattern data model plus RBAC and audit log support. It is a fit when automation depends on a defined schema and pattern changes must remain consistent across revisions.
Manufacturing-focused teams needing governed pattern data integration with measurement and grading consistency
Gerber AccuMark ties grading and measurement logic to CAD-ready pattern assets and supports governed model updates through configuration-driven workflow points. It fits teams that need repeatable outputs across style libraries and ecosystem downstream manufacturing steps.
Apparel design teams needing measurement-driven grading rules that recalculate size runs
Optitex supports rule-based grading tied to measurement updates that recalculates size runs automatically. It fits teams that want parameter-driven automation to reduce redraw loops during style iterations.
Apparel teams that must propagate pattern, grading, and marker edits through a shared garment data model
Browzwear centers on a single garment data model that propagates pattern, grading, and marker workflows through configured fit workflows. It fits teams that need API and integration hooks with configuration-driven runs for reproducible transformations.
Operations teams running Zund cutting jobs that require parameter mapping into executable runs
Zund GSS provides pattern job integration that maps defined parameters from inputs to executable Zund production runs. It fits teams that need admin configuration controls for publishing and executing pattern jobs across connected assets.
Failure modes that appear when pattern makers are chosen without schema discipline or governance depth
Several reviewed tools show repeatable pitfalls when teams underestimate how much integration work depends on schema mapping and revision metadata alignment. Automation that depends on established parameter schemas can become a blocker when existing workflows do not match the tool's data conventions.
Governance also gets missed when RBAC and auditability are assumed to be present or when integration is built on exports instead of synchronized data models.
Selecting a tool that exports files but lacks an API-ready data sync path
CLO Virtual Fashion often relies on file exchange for integration rather than data synchronization, and it limits event-driven, schema-based provisioning. Zund GSS avoids this failure mode by provisioning pattern jobs through API and system integrations that map parameters into executable runs.
Building automation on freeform edits without a parameter schema
Antenna Design Studio requires custom automation to follow the established pattern parameter schema, so exploratory edits can require more input mapping. Optitex reduces this problem by using rule-based grading tied to measurement updates that recalculates size runs from consistent conventions.
Assuming governance controls match enterprise audit expectations
Marvelous Designer does not position RBAC and audit log governance as core administration primitives, which can complicate compliance workflows. Antenna Design Studio offers RBAC and audit log support for controlled change tracking, and Zund GSS relies on admin configuration controls that shape permissions for publishing and running jobs.
Ignoring how throughput changes under batch workloads and simulation-heavy iteration
Marvelous Designer can reduce throughput for large batch pattern sets because high-fidelity simulation adds iteration cost. Zund GSS and Antenna Design Studio are more aligned to governed automation and controlled provisioning for recurring work, which helps maintain throughput when many patterns must be updated.
How We Selected and Ranked These Tools
We evaluated Antenna Design Studio, Gerber AccuMark, Optitex, Browzwear, CLO Virtual Fashion, Marvelous Designer, Tailornova, Tukatech, and Zund GSS using three scoring lenses. Each tool received an overall rating driven most by features, with features carrying the largest weight, while ease of use and value each contributed less but still materially affected the ranking. This is editorial research and criteria-based scoring using the provided capability summaries, not hands-on lab testing or private benchmark experiments.
Antenna Design Studio separated from lower-ranked options because its revisioned, parameterized pattern data model supports controlled provisioning and synchronization and it pairs that with RBAC and audit log support. Those two capabilities lift the features score through schema-oriented automation and also lift ease-of-use in workflows that require consistent propagation across revisions.
Frequently Asked Questions About Pattern Maker Software
Which pattern maker tools provide an API-driven data model for governed pattern generation?
How do pattern makers handle SSO, RBAC, and audit trails for admin governance?
What is the best option for migrating existing size runs, grading rules, and measurement logic into a new tool?
Which tools support parameterized pattern variants so changes propagate consistently across production stages?
What is the main tradeoff between 2D-to-3D iteration tools and CAD pattern tools focused on CAD outputs?
Which pattern maker tools integrate most cleanly with PLM and downstream manufacturing systems?
How do rule-based grading updates get recalculated across multiple size runs?
What approach avoids schema drift when multiple teams collaborate on pattern templates and versions?
Which tool best supports automated pattern job execution for production cutters and shopfloor systems?
Conclusion
After evaluating 9 art design, Antenna Design Studio stands out as our overall top pick — it scored highest across our combined criteria of features, ease of use, and value, which is why it sits at #1 in the rankings above.
Use the comparison table and detailed reviews above to validate the fit against your own requirements before committing to a tool.
Tools reviewed
Primary sources checked during evaluation.
Referenced in the comparison table and product reviews above.
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